For semiconductor and liquid crystal manufacturing machines and for solar equipment

Mirror finished Silicon Nitride(Si3N4) substrate

Silicon Nitride (Si3N4) substrate. One side mirror is finished Size: □100 X 0.25t +0/ -0.01 Surface roug[…..]

Plasma-Resistant High Purity Yttria Cap plasma-resistant caps with high-purity Yttria. The cap is thread[…..]

Size φ32×φ28×240L inner surface The pipe is made of high-purity yttria (99.9% or more) with excellent p[…..]

600×450　Grade JIS00（Flatness 2.5um） High-purity alumina ceramic with high quality granite on top. Highl[…..]

When using a vacuum chuck for a purpose of holding and transporting a workpiece, it is common to connec[…..]

At the copper material lead frame stamping line, Tungsten metal material is used as a stamping pin generally.&[…..]

NAC produces Large size Aluminum Nitride (AlN) ceramic plate with CIP method. ALN-17[…..]

Material: High purity Yttria(99.9%~) N-100Y Size: φ320 Process flow: Foaming, Unfired machining, Sinter[…..]

NAC produce a ceramic dummy wafer in a variety of material and spec. Material choice example: AlN-HYO Aluminum[…..]

AlN-230 Substate AlN-230 Aluminum nitride 230W/mk ceramic substrate is available now. Square plat[…..]